Editors: | Kongoli F, Braems I, Demange V, Dubois JM, Pech-Canul M, Patino CL, Fumio O |
Publisher: | Flogen Star OUTREACH |
Publication Year: | 2017 |
Pages: | 249 pages |
ISBN: | 978-1-987820-75-1 |
ISSN: | 2291-1227 (Metals and Materials Processing in a Clean Environment Series) |
A hybrid structure of Mn doped SnO2 (MTO)/Ag/ Mn doped SnO2 (MTO)/SiO2/TiO2 was deposited on PET substrate by sequential RF/DC magnetron sputtering at room temperature. Optical and electrical properties were systematically investigated as a function of SiO2 thickness. In order to estimate the optical characteristics and compare them with experimental results in advance, the simulation program named EMP (Essential Macleod Program) was adopted. EMP simulation results suggested that a multilayered film of MTO (40 nm)/Ag (10 nm)/MTO (40 nm))/SiO2 (120 nm)/TiO2(10 nm) exhibited the highest visible transmittance of 86.4 % at 550 nm, whereas experimentally measured transmittance showed 85.1 % for MTO (40 nm)/Ag (10 nm)/MTO (40 nm))/SiO2 (90 nm)/TiO2(10 nm), somewhat lower than simulation data. X-ray diffraction patterns of the prepared SnO2 multi-layered films were found to have a typical amorphous phase. Measured film thickness was about 190 nm. The lowest Rs was about 7.4 次/sq, acquired at the multi-layers with the structure of MTO (40 nm)/Ag (10 nm)/ MTO (40 nm)/ SiO2 (90 nm)/TiO2(10 nm). In addition, the sheet resistance and resistivity of MTO/Ag/MTO/SiO2/TiO2 multi layer films little changed with increasing the thickness of SiO2 layer from 10 to 120 nm. It was shown that the 朴TC values of MTO/Ag/MTO/SiO2/TiO2 multi layer film were in the range of 28.2 每 40.6 , 10-3 次 每1.