Editors: | Kongoli F, Noldin JH, Mourao MB, Tschiptschin AP, D'Abreu JC |
Publisher: | Flogen Star OUTREACH |
Publication Year: | 2015 |
Pages: | 550 pages |
ISBN: | 978-1-987820-26-3 |
ISSN: | 2291-1227 (Metals and Materials Processing in a Clean Environment Series) |
The removal of boron and phosphorus from metallurgical grade silicon by refining with Na2O-SiO2; Na2O-SiO2-CaF2 slags was studied. The study evaluated the effects of temperature (1550 A°C and 1650 A°C), basicity (2 and 6), time (0, 5 15, 30, 60 and 120 minutes) variables and ratio silicon/slag (4:1, 2:1: 1:1, 1:2). Assays were performed in induction furnace under argon and high-density graphite crucible. In boron removal assessment, ICP-OES analytical techniques were used in the analysis of the levels of boron in silicon, XRF analysis was used in the composition of the slag after testing and optical microscopy was used to quantify the silicon present in the slag after testing. From the results, it can be concluded that the removal of boron using slags containing sodium is possible under non-equilibrium conditions in approximately 30 minutes after total dissolution of the slag. It was found that the removal of boron is higher than 1650°C.