2014-Sustainable Industrial Processing Summit
SIPS 2014 Volume 5: Composite, Ceramic, Quasi-crystals, Nanomaterials & Coatings
| Editors: | Kongoli F |
| Publisher: | Flogen Star OUTREACH |
| Publication Year: | 2014 |
| Pages: | 578 pages |
| ISBN: | 978-1-987820-07-2 |
| ISSN: | 2291-1227 (Metals and Materials Processing in a Clean Environment Series) |
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Preparation and characterization of Cr2O3 thin films deposited using electron beam evaporation method
Vishal Baloria1;1GURU NANAK DEV UNIVERSITY, AMRITSAR, Amritsar, India;
Type of Paper: Regular
Id Paper: 250
Topic: 14
Abstract:
Semiconductor oxide materials are one of the focuses in material science, owing to their unusual geometry and promising physical properties. Recently there is a great interest in the synthesis of wide-band gap semiconductors, since they have many possible applications in optical and electronic devices. Among such materials, Chromium oxide (Cr2O3) is a wideband gap (Eg~3eV), p-type semiconductor and it is an important refractory material because of its high melting temperature (~2300°C) and high temperature oxidation resistance. It is widely been used in a variety of applications, such as catalytic reactions, optical coatings and sensors. In the present communication we present a systematic study on preparation and characterization of Cr2O3 thin films.
Cr2O3 thin films were prepared in two steps. Cr films were first deposited by electron-beam evaporation and subsequently subjected to thermal oxidation at 700EšC/2 h under oxygen flow of 50 sccm. The structural and optical characterization of prepared films was performed using X-ray diffraction (XRD), Scanning electron microscopy (SEM) and UV-Visible spectrometry.